ISV-M4 Festo Vacuum Security Valve

$ 27.25

Ultra-compact M4 vacuum security valve designed to maintain system vacuum when suction cups are uncovered. Features an operating pressure range of -0.95 to 0 bar and supports ejector pulses up to 8 bar.

SKU Festo-545996 Category
Vacuum security valves

ISV-M4 Festo Vacuum security valve

Model Identifier ISV-M4
Official Part Number 545996
GTIN Standard 4052568051259

Technical Overview

The Festo ISV-M4 is a compact vacuum security valve designed for vacuum systems to maintain pressure levels when suction cups are not in contact with the workpiece. Constructed with a wrought aluminium alloy housing and a sintered bronze filter, this screw-in valve supports operating pressures down to -0.95 bar and is compatible with ejector pulses up to 0.8 MPa. It provides moderate corrosion resistance (CRC 2) and conforms to VDMA24364-B1/B2-L LABS standards, making it suitable for diverse industrial automation environments.

Key Features

  • Optional mounting position
  • Moderate corrosion resistance (CRC 2)
  • LABS (PWIS) conformity VDMA24364-B1/B2-L
  • Compact M4 screw-in mounting
  • Integrated sintered bronze filter
  • Lightweight wrought aluminium alloy housing

Suitable for ejector pulse up to 0.8 MPa (8 bar) for high-speed vacuum system compatibility

Technical Specification Matrix

ParameterValue
SizeM4
Suitable for ejector pulse≤0.8 MPa
Suitable for ejector pulse (bar)≤8 bar
Mounting positionoptional
Symbol00991481
Operating pressure (MPa)-0.095 MPa ... 0 MPa
Operating pressure (bar)-0.95 bar ... 0 bar
Required suction volumetric flow at -0.05 MPa (-0.5 bar, -7.25 psi)1 l/min
Operating mediumCompressed air to ISO 8573-1:2010 [7:-:-]
Corrosion resistance class CRC2 - Moderate corrosion stress
LABS (PWIS) conformityVDMA24364-B1/B2-L
Ambient temperature-10 °C ... 60 °C
Product weight1.5 g
Type of mountingScrew-in
Pneumatic connection, port 1M4
Pneumatic connection, port 2M4
Material filterSintered bronze
Material housingWrought aluminium alloy

Industrial Applications

1. Variable Pattern SMT Component Placement

Integration into high-speed multi-head pick-and-place nozzles for Surface Mount Technology (SMT) assembly. The ISV-M4 valves are installed inline with miniature suction cups to handle batches of electronic components (e.g., capacitors, chips) where the quantity or arrangement varies per cycle.

Problem Solved

Prevents total system vacuum loss when specific nozzles in a multi-head gripper do not contact a part (due to variable batch sizes or missing feeder components). Without these valves, open ports would bleed vacuum pressure, causing the remaining gripped components to drop during high-acceleration transfers.

M4 Pneumatic Connection1.5g Lightweight DesignVacuum SecuritySMT AssemblyPick and Place

2. Automated Palletizing of Incomplete Box Layers

Used in large-area vacuum foam or suction cup grippers for end-of-line palletizing robots. The valves automatically isolate suction cups that land on gaps or missing boxes when handling irregular or partial pallet layers.

Problem Solved

Eliminates the need for complex active solenoid control systems to switch off specific suction zones. The valve's passive closure upon high flow (1 l/min threshold) ensures that lifting force is concentrated only on the cups sealing against boxes, while the 'Suitable for ejector pulse' rating (≤8 bar) allows for high-pressure blow-off to rapidly release heavy loads.

Ejector Pulse ≤8 barPassive Vacuum IsolationEnd-of-Arm ToolingPalletizingFlow Switching

3. Photovoltaic Wafer Array Transfer

Implementation in vacuum transfer frames for handling fragile solar silicon wafers in array formats. The ISV-M4 valves protect the handling process if a wafer is cracked, broken, or missing during the pickup step.

Problem Solved

Maintains critical vacuum levels (-0.95 bar) for the intact wafers even if one suction point leaks due to breakage. This prevents the catastrophic drop of an entire expensive solar array. The sintered bronze filter prevents silicon dust ingestion, and the CRC 2 corrosion resistance suits the chemical environment of wafer processing.

Vacuum Retention -0.95 barSintered Bronze FilterWafer HandlingLeak CompensationCRC 2 Corrosion Resistance

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